Mask Aligner / Lithography System
UX-4 Series - Full Field Projection
This projection aligner uses Ushio's unique large-field projection lens technology, light source, and other optical technologies developed over many years. It enables the exposure of 8-inch wafers in one pass without touching the mask. The large depth of field allows for the correct exposure of non-flat wafers, resulting in higher productivity and yield — something that is not possible with a proximity aligner.
Find all information here